The
AVS Short Course Webinar focusing on
Atomic Layer Deposition (ALD): Basic Principles, Characterizations, and Applications will be held on Thursday, March 15, 2018 from 1:00-5:00 p.m (EDT). This webinar will be taught by AVS Instructor, Robert K. Grubbs. Dr. Grubbs has been working in the semiconductor industry and in the area of national security. This webinar on ALD is for anyone who wants to know specific details about how the ALD process works and how to implement ALD in a laboratory setting. It will cover the basic aspects of the chemical mechanism of ALD and how that leads to the unique and potent properties of an ALD process. Multiple examples of ALD chemistry will be covered as well as reactor design, chemical precursor properties, plasma ALD, and molecular layer deposition (MLD).
Who should attend: Technicians, graduate students and engineers who are working with the ALD and want to know more about the subject and for the novice who wants to become more familiar with the exciting and ever expanding field of Atomic Layer Deposition.
Date: March
15, 2018
Time: 1:00-5:00 p.m. (EDT)
Cost: $200/person
REGISTRATION DEADLINE: March 13, 2018
Questions: E-mail heather@avs.org or call 530-896-0477.
